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Non-Classical Crystallization of Thin Films and Nanostructures in CVD and PVD Processes
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349
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750
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673
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529
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The content of this book would be based on Prof. Hwang's one-semester lectures on "Special Topics on Semiconductor Materials" for graduate students. The lectures are based on the new understanding of the growth of thin films and nanostructures by chemical vapor deposition (CVD). Most thin films and nanostructures have been believed to grow by individual atoms or molecules. According to Hwang's research over the last two decades, however, the generation of charged gas phase nuclei is the rule rather than the exception in the CVD process. Besides, charged gas phase nuclei are actively involved in the growth of films or nanostructures. This new understanding is called the theory of charged nanoparticles (TCN). Four review papers and over 70 papers on the TCN were published. This means that the growth of thin films by CVD, which plays such an important role in the synthesis of advanced materials in modern industries, has been approached on the incorrect understanding, which would inevitably increase the number of trials-and-errors in the optimization of thin film processes.
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