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Thin carbon containing films
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The composite materials highly enriched with carbon species attract rapidly growing attention motivated by a wide spectrum of their potential applications. This book describes the detailed investigations concerning processing and stability of thin films including carbon species and their possible application as materials of a low dielectric constant (low-k). In order to gather a complex information regarding the chemical, morphological and dielectric properties of the produced layers a combination of the spectroscopy: X-ray photoelectron spectroscopy (XPS), near edge X-ray absorption fine structure spectroscopy (NEXAFS) and Fourier transform infrared spectroscopy (FTIR), microscopy: atomic force microscopy (AFM) and electrical characterization: capacitance-voltage technique (CV) have been applied.
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